Magnetron sputtering has become the most widely used technique for thin film deposition and is utilized in numerous industrial applications. We provide a self-consistent and complete description of its dynamics. Examples are:
Another efficient tool for studying magnetron sputtering is the global model, which we used to study the discharge characteristics of HiPIMS and reactive HiPIMS, influence of geometric factors on plasma dynamics, and the influence of the target material in HiPIMS discharges.
Radio frequency (RF) plasmas are widely used in numerous industrial applications. We have studied several fundamental issues in RF discharges and explored the design and optimization of some new RF plasma sources. Examples are:
Microplasmas have received increasing attention in the last few decades for their wide range of applications in light sources, lasers, spectroscopy, surface processing and biomedicine. We have studied several fundamental issues of microplasma discharges. Some examples include: